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RF power for plasma processing

RF power for plasma

Generators, matches, sensors and filters. One RF path. For PECVD, etch, diffusion, ion source and sputter tools.

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02Inside the Barracuda

CVS designs and builds RF power equipment for PECVD, etch, diffusion, ion source and sputter tools in semiconductor, photovoltaic and display manufacturing.

  • TopologyClass ECW and pulsed output as standard
  • Pulse frequency150 Hz – 50 kHz<10 ms RF-on response
  • ChassisHalf-rack, water-cooledUp to 5.5 kW · ≤ −45 dBc harmonics
300 kHz – 13.56 MHz
Generator frequencies
0.9 – 5.5 kW
Generator power
<2 s
Match tune time
12 months
Warranty

03How the products fit together

The RF
delivery path

  1. 01
    Generator

    Barracuda · Snapper

    Regulated RF power, CW or pulsed.

  2. 02
    Sensor (option)

    Phase-X

    Measures V, I, phase and load impedance.

  3. 03
    Match

    Cruiser Solo · Duo

    Transforms the plasma load to 50 Ω.

  4. 04
    Chamber

    Plasma load

    Electrode, pedestal, showerhead.

  5. 05
    RF filter

    Heater · E-chuck · Faceplate

    Keep RF off the chamber's heater and chuck supply lines.

04Product families

01 / 05

RF generator · 13.56 MHz

Barracuda

Class E generator with CW and pulsed output as standard. Up to 5.5 kW in a half-rack, water-cooled chassis.

1.5 / 3 / 5.5 kW
Rated output
150 Hz – 50 kHz
Pulse frequency
<10 ms
RF-on response
≤ −45 dBc
Harmonics

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RF generator · 300–450 kHz

Snapper

MF-900 / MF-1250. Low-frequency generator with a built-in 7-tap output transformer that matches low-impedance plasma loads. Frequency adjustable from 300 to 450 kHz.

900 / 1250 W
Rated output
10–125 Ω
Output impedance
±1% or ±2 W
Regulation
2U
19-inch rack

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Automatic match networks

Cruiser

Solo: single-frequency 13.56 MHz matches from 1.6 to 10 kW. Duo: two matches with one output, 13.56 MHz with 400 kHz or 2 MHz. Tuning range configured to the chamber. Optional built-in Phase-X sensor.

<2 s
Tune time
<1 s
From preset
1.6 – 10 kW
Solo input power
13.56 MHz ±5%
Frequency band

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In-line V-I sensor · 400 kHz – 13.56 MHz

Phase-X

Measures voltage, current, phase and load impedance at the chamber in real time. A microsecond-level TTL trigger gives the tool fast feedback for closed-loop control, including an endpoint signal for low open-area etch.

1–1000 Vrms
Voltage range
0.1–35 Arms
Current range
±0.3°
Phase accuracy
±2%
Power accuracy, 0–30°

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LC low-pass filters · 400 kHz and 13.56 MHz

RF filters

Keep RF energy off heater, electrostatic chuck and faceplate supply lines. All models monitor common-mode noise and protect against over-temperature.

≥30 dB
at 13.56 MHz
≥10 dB
at 400 kHz
1 – 3
Channels
2000 VDC
Withstand, 1 min

Request full specifications ▸

Connectors, communication protocol, tuning range and enclosure size are configured to the customer's tool.

05Company

Built in Shanghai. Running on PECVD tools in production.

CVS Precision Technologies (上海世炜科技有限公司) designs and builds RF power conversion equipment in Shanghai. Our products run on PECVD tools in production, and they replace installed Advanced Energy Apex and PDX units.

International sales: CVS Precision Technologies, Ltd., Colorado, USA.

2026
Founded
1500 m²
Plant, Fengxian, Shanghai
40 units
Installed on 10 PECVD tools
Jiangyin · Wuxi
Service locations

06Ordering and service

Built to run.
Backed when it doesn't.

Warranty 12months

Warranty from shipment.

Lead time 8–12weeks

Standard lead time.

Repair 14days

Repair turnaround.

Documentation EN · 中文

Operation manuals, outline drawings, 3D models and test reports on request.

07Contact

Talk to an RF applications engineer about your chamber.

Send the tool model, chamber process and the RF unit you use today. We reply within one working day.

Sales sales@cvs-precision.com
Phone +86 139 2654 4148
Factory
上海世炜科技有限公司
3F, Building 9, Block 1, No. 288 Huifeng North Road
Fengxian District, Shanghai, China
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